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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques

Participants in the publication
I. Ferreira (Author)
E. Fortunato (Author)
P. Vilarinho (Author)
A.S. Viana (Author)
Dep. Química e Bioquímica
 CQB
 CQE
 A.R. Ramos (Author)
E. Alves (Author)
R. Martins (Author)

Date of Publication
2006-06

Where published
Journal of Non-Crystalline Solids

Publication Identifiers

Publisher
Elsevier BV

Volume
352
Number
9-20

Number of pages
5
Starting page
1361
Last page
1366

Document Identifiers
DOI - https://doi.org/10.1016/j.jnoncrysol.2006.02.025
URL - http://dx.doi.org/10.1016/j.jnoncrysol.2006.02.025

Rankings
SCIMAGO Q1 (2004) - 1.007 - Material Chemistry


Export

APA
I. Ferreira, E. Fortunato, P. Vilarinho, A.S. Viana, A.R. Ramos, E. Alves, R. Martins, (2006). Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques. Journal of Non-Crystalline Solids, 352, 1361-1366. http://dx.doi.org/10.1016/j.jnoncrysol.2006.02.025

IEEE
I. Ferreira, E. Fortunato, P. Vilarinho, A.S. Viana, A.R. Ramos, E. Alves, R. Martins, "Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques" in Journal of Non-Crystalline Solids, vol. 352, pp. 1361-1366, 2006. 10.1016/j.jnoncrysol.2006.02.025

BIBTEX
@article{50828, author = {I. Ferreira and E. Fortunato and P. Vilarinho and A.S. Viana and A.R. Ramos and E. Alves and R. Martins}, title = {Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques}, journal = {Journal of Non-Crystalline Solids}, year = 2006, pages = {1361-1366}, volume = 352 }