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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Oxygen redistribution during diffusion in thin silicon layers

Participants in the publication
J. M. Serra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
 IDL
 A.M. Vallera (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
 SESUL
Date of Publication
1996

Where published
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

Publication Identifiers
ISSN - 0921-5107

Address
LAUSANNE, SWITZERLAND

Publisher
Elsevier Science

Volume
36
Number
1-3

Starting page
175
Last page
178

Document Identifiers
DOI - https://doi.org/10.1016/0921-5107(95)01305-9

Rankings
SCOPUS Q1 (2013) - 0.747 - Mechanical Engineering

Keywords
Diffusion Oxygen Silicon Thin films


Export

APA
J. M. Serra, A.M. Vallera, (1996). Oxygen redistribution during diffusion in thin silicon layers. MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 36, 175-178. ISSN 0921-5107. eISSN .

IEEE
J. M. Serra, A.M. Vallera, "Oxygen redistribution during diffusion in thin silicon layers" in MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, vol. 36, pp. 175-178, 1996. 10.1016/0921-5107(95)01305-9

BIBTEX
@article{34512, author = {J. M. Serra and A.M. Vallera}, title = {Oxygen redistribution during diffusion in thin silicon layers}, journal = {MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS}, year = 1996, pages = {175-178}, volume = 36 }