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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes

Participants in the publication
H. Águas (Author)
L. Pereira (Author)
I. Ferreira (Author)
A. R. Ramos (Author)
A. S. Viana (Author)
Dep. Química e Bioquímica
 J. Andreu (Author)
P. Vilarinho (Author)
E. Fortunato (Author)
R. Martins (Author)

Date of Publication
2004

Where published
JOURNAL OF NON-CRYSTALLINE SOLIDS

Publication Identifiers
ISSN - 0022-3093

Volume
338-340

Starting page
810
Last page
813

Document Identifiers
DOI - https://doi.org/10.1016/j.jnoncrysol.2004.03.097


Export

APA
H. Águas, L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, R. Martins, (2004). Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes. JOURNAL OF NON-CRYSTALLINE SOLIDS, 338-340, 810-813. ISSN 0022-3093. eISSN .

IEEE
H. Águas, L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, R. Martins, "Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes" in JOURNAL OF NON-CRYSTALLINE SOLIDS, vol. 338-340, pp. 810-813, 2004. 10.1016/j.jnoncrysol.2004.03.097

BIBTEX
@article{17251, author = {H. Águas and L. Pereira and I. Ferreira and A. R. Ramos and A. S. Viana and J. Andreu and P. Vilarinho and E. Fortunato and R. Martins}, title = {Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes}, journal = {JOURNAL OF NON-CRYSTALLINE SOLIDS}, year = 2004, pages = {810-813}, volume = 338-340 }