Exportar referência
APA
H. Águas, L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, R. Martins, (2004). Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes. JOURNAL OF NON-CRYSTALLINE SOLIDS, 338-340, 810-813. ISSN 0022-3093. eISSN .
IEEE
H. Águas, L. Pereira, I. Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, P. Vilarinho, E. Fortunato, R. Martins, "Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes" in JOURNAL OF NON-CRYSTALLINE SOLIDS, vol. 338-340, pp. 810-813, 2004.
10.1016/j.jnoncrysol.2004.03.097
BIBTEX
@article{17251,
author = {H. Águas and L. Pereira and I. Ferreira and A. R. Ramos and A. S. Viana and J. Andreu and P. Vilarinho and E. Fortunato and R. Martins},
title = {Effect of an Interfacial Oxide Layer in the Annealing Behaviour of Au/a-Si:H MIS Photodiodes},
journal = {JOURNAL OF NON-CRYSTALLINE SOLIDS},
year = 2004,
pages = {810-813},
volume = 338-340
}