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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Thin-Film Characterization for High-Temperature Applications

Participants in the publication
M. J. Lourenço (Author)
Dep. Química e Bioquímica
CCMM - Centro de Ciências Moleculares e Materiais 
CQE-Ciências - Centro de Química Estrutural-Ciências
J. M. Serra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
SESUL - Centro de Sistemas de Energia Sustentáveis
IDL - Instituto Dom Luiz
CQE-Ciências - Centro de Química Estrutural-Ciências
M. R. Nunes (Author)
FACULDADE DE CIÊNCIAS DA UNIVERSIDADE DE LISBOA
A. M. Vallêra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
SESUL - Centro de Sistemas de Energia Sustentáveis
IDL - Instituto Dom Luiz
C. A. Nieto de Castro (Author)
Dep. Química e Bioquímica
CCMM - Centro de Ciências Moleculares e Materiais 
CQE-Ciências - Centro de Química Estrutural-Ciências

Scope
International

Refereeing
Yes

Summary
Most thin films produced by a wide variety of methods, either physical or chemical (PVD, CVD, sputtering, etc.) for temperature sensor applications, can be used only in very narrow ranges of temperatures, where their components are not subjected to differential thermal expansions, recrystallizations, and grain size modifications. This paper reports the production and characterization of thin films of platinum and titanium in ceramic substrates by one of the physical vapor deposition techniques, the e-gun evaporation. The choice of materials and the determination of film thickness, density, electrical resistivity, surface roughness, and structural characterization (X-ray, SEM, and AES) are studied. Special emphasis is given to the thermal and electrical behavior of these films between room temperature and 1000°C.

Date of Publication
1998

Institution
FACULDADE DE CIÊNCIAS DA UNIVERSIDADE DE LISBOA

Where published
International Journal of Thermophysics

Publication Identifiers

Publisher
Springer Science and Business Media LLC

Volume
19
Number
4

Number of pages
13
Starting page
1253
Last page
1265

Document Identifiers
DOI - https://doi.org/10.1023/a:1022614431285
URL - http://dx.doi.org/10.1023/a:1022614431285

Keywords
aluminadensity high temperature platinum PVD resistance thermal sensor thin films

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APA
M. J. Lourenço, J. M. Serra, M. R. Nunes, A. M. Vallêra, C. A. Nieto de Castro, (1998). Thin-Film Characterization for High-Temperature Applications. International Journal of Thermophysics, 19, 1253-1265. http://dx.doi.org/10.1023/a:1022614431285

IEEE
M. J. Lourenço, J. M. Serra, M. R. Nunes, A. M. Vallêra, C. A. Nieto de Castro, "Thin-Film Characterization for High-Temperature Applications" in International Journal of Thermophysics, vol. 19, pp. 1253-1265, 1998. 10.1023/a:1022614431285

BIBTEX
@article{51090, author = {M. J. Lourenço and J. M. Serra and M. R. Nunes and A. M. Vallêra and C. A. Nieto de Castro}, title = {Thin-Film Characterization for High-Temperature Applications}, journal = {International Journal of Thermophysics}, year = 1998, pages = {1253-1265}, volume = 19 }