BIBLIOS

Document type
Journal articles

Document subtype
Full paper

Title
Thin-Film Characterization for High-Temperature Applications

Participants in the publication
M. J. Lourenço (Author)
Dep. Química e Bioquímica
CQE
J. M. Serra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
SESUL
IDL
CQE
M. R. Nunes (Author)
FACULDADE DE CIÊNCIAS DA UNIVERSIDADE DE LISBOA
A. M. Vallêra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
SESUL
IDL
C. A. Nieto de Castro (Author)
Dep. Química e Bioquímica
CQE

Summary
Most thin films produced by a wide variety of methods, either physical or chemical (PVD, CVD, sputtering, etc.) for temperature sensor applications, can be used only in very narrow ranges of temperatures, where their components are not subjected to differential thermal expansions, recrystallizations, and grain size modifications. This paper reports the production and characterization of thin films of platinum and titanium in ceramic substrates by one of the physical vapor deposition techniques, the e-gun evaporation. The choice of materials and the determination of film thickness, density, electrical resistivity, surface roughness, and structural characterization (X-ray, SEM, and AES) are studied. Special emphasis is given to the thermal and electrical behavior of these films between room temperature and 1000°C.


Institution
FACULDADE DE CIÊNCIAS DA UNIVERSIDADE DE LISBOA

Where published
International Journal of Thermophysics

Publication Identifiers

Publisher
Springer Science and Business Media LLC



Document Identifiers
DOI - https://doi.org/10.1023/a:1022614431285
URL - http://dx.doi.org/10.1023/a:1022614431285

Keywords
aluminadensity high temperature platinum PVD resistance thermal sensor thin films

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