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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films

Participants in the publication
A.C. Duarte (Author)
N. Franco (Author)
A.S. Viana (Author)
Dep. Química e Bioquímica
 N.I. Polushkin (Author)
A.J. Silvestre (Author)
O. Conde (Author)
Dep. Física
Date of Publication
2016-11-00

Where published
Journal of Alloys and Compounds

Publication Identifiers
ISSN - 0925-8388

Publisher
Elsevier BV

Volume
684

Starting page
98
Last page
104

Document Identifiers
DOI - https://doi.org/10.1016/j.jallcom.2016.05.167
URL - http://dx.doi.org/10.1016/j.jallcom.2016.05.167

Rankings
Web Of Science Q1 (2016) - 3.133 - Materials Science, Multidisciplinary
SCIMAGO Q1 (2016) - 0.954 - Materials Science, Materials Chemistry


Export

APA
A.C. Duarte, N. Franco, A.S. Viana, N.I. Polushkin, A.J. Silvestre, O. Conde, (2016). Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films. Journal of Alloys and Compounds, 684, 98-104. ISSN 0925-8388. eISSN . http://dx.doi.org/10.1016/j.jallcom.2016.05.167

IEEE
A.C. Duarte, N. Franco, A.S. Viana, N.I. Polushkin, A.J. Silvestre, O. Conde, "Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films" in Journal of Alloys and Compounds, vol. 684, pp. 98-104, 2016. 10.1016/j.jallcom.2016.05.167

BIBTEX
@article{38307, author = {A.C. Duarte and N. Franco and A.S. Viana and N.I. Polushkin and A.J. Silvestre and O. Conde}, title = {Argon assisted chemical vapor deposition of CrO2: An efficient process leading to high quality epitaxial films}, journal = {Journal of Alloys and Compounds}, year = 2016, pages = {98-104}, volume = 684 }