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APA
J M Pó, M C Brito, J Maia Alves, J A Silva, J M Serra, A M Vallêra, (2013). Measurement of the dopant concentration in a semiconductor using the Seebeck effect. MEASUREMENT SCIENCE & TECHNOLOGY, 24, ISSN 0957-0233. eISSN .
IEEE
J M Pó, M C Brito, J Maia Alves, J A Silva, J M Serra, A M Vallêra, "Measurement of the dopant concentration in a semiconductor using the Seebeck effect" in MEASUREMENT SCIENCE & TECHNOLOGY, vol. 24, 2013.
10.1088/0957-0233/24/5/055601
BIBTEX
@article{34682,
author = {J M Pó and M C Brito and J Maia Alves and J A Silva and J M Serra and A M Vallêra},
title = {Measurement of the dopant concentration in a semiconductor using the Seebeck effect},
journal = {MEASUREMENT SCIENCE & TECHNOLOGY},
year = 2013,
volume = 24
}