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Publication details

Document type
Journal articles

Document subtype
Full paper

Title
Photodefined etching of n+ layers diffused on p-type silicon substrates

Participants in the publication
R. S. Videira (Author)
R. M. Gamboa (Author)
J. M. Alves (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
 IDL
 J. M. Serra (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
 IDL
 A. M. Vallera (Author)
Dep. Engenharia Geográfica, Geofísica e Energia
 SESUL
Date of Publication
1999

Where published
APPLIED SURFACE SCIENCE

Publication Identifiers
ISSN - 0169-4332

Publisher
Elsevier Science

Volume
138

Starting page
29
Last page
34

Document Identifiers
DOI - https://doi.org/10.1016/s0169-4332(98)00595-9

Rankings
Web Of Science Q3 (1999) - 1.195 - Chemistry, Physical
Web Of Science Q2 (1999) - 1.195 - Materials Science, Coatings and Films
Web Of Science Q2 (1999) - 1.195 - Physics, Applied
Web Of Science Q2 (1999) - 1.195 - Physics, Condensed Matter
SCIMAGO Q1 (1999) - 1.017 - Surfaces, Coatings and Films

Keywords
Silicon photoetching


Export

APA
R. S. Videira, R. M. Gamboa, J. M. Alves, J. M. Serra, A. M. Vallera, (1999). Photodefined etching of n+ layers diffused on p-type silicon substrates. APPLIED SURFACE SCIENCE, 138, 29-34. ISSN 0169-4332. eISSN .

IEEE
R. S. Videira, R. M. Gamboa, J. M. Alves, J. M. Serra, A. M. Vallera, "Photodefined etching of n+ layers diffused on p-type silicon substrates" in APPLIED SURFACE SCIENCE, vol. 138, pp. 29-34, 1999. 10.1016/s0169-4332(98)00595-9

BIBTEX
@article{34505, author = {R. S. Videira and R. M. Gamboa and J. M. Alves and J. M. Serra and A. M. Vallera}, title = {Photodefined etching of n+ layers diffused on p-type silicon substrates}, journal = {APPLIED SURFACE SCIENCE}, year = 1999, pages = {29-34}, volume = 138 }